Inverted plasmonic lens design for nanometrology applications

verfasst von: T. Kaseberg, T. Siefke, S. Kroker, B. Bodermann
Abstract: Planar plasmonic lenses have attracted a great deal of interest over the last few years for their super-resolution focusing capabilites. These highly compact structures with dimensions of only a few micrometres allow for the focusing of light to sub-wavelength-sized spots with focal lengths reaching into the far-field. This offers opportunities for new methods in nanometrology; for example, applications in microscopic Mueller matrix ellipsometry setups. However, the conventional plasmonic lens is challenging to fabricate. We present a new design for plasmonic lenses, which is called the inverted plasmonic lens, to accommodate the lithographic fabrication process. In this contribution, we used numerical simulations based on the finite element method in combination with particle swarm optimization to determine ideal parameter ranges and tolerances for the design of inverted plasmonic lenses for different wavelengths in the visible and near-infrared domain and focal lengths between 5 m and 1 mm.
Externe Organisation(en): Physikalisch-Technische Bundesanstalt (PTB)
Friedrich-Schiller-Universität Jena
Technische Universität Braunschweig
Typ: Artikel
Journal: Measurement science and technology
Band: 31
ISSN: 0957-0233
Publikationsdatum: 07.2020
Publikationsstatus: Veröffentlicht
Peer-reviewed: Ja
ASJC Scopus Sachgebiete: Instrumentierung, Ingenieurwesen (sonstige), Angewandte Mathematik
Elektronische Version(en): https://doi.org/10.1088/1361-6501/ab7e6b (Zugang: Offen)

BibTeX

@article{96fdd97f35914df497d05956c7d8e97b,
title = "Inverted plasmonic lens design for nanometrology applications",
abstract = "Planar plasmonic lenses have attracted a great deal of interest over the last few years for their super-resolution focusing capabilites. These highly compact structures with dimensions of only a few micrometres allow for the focusing of light to sub-wavelength-sized spots with focal lengths reaching into the far-field. This offers opportunities for new methods in nanometrology; for example, applications in microscopic Mueller matrix ellipsometry setups. However, the conventional plasmonic lens is challenging to fabricate. We present a new design for plasmonic lenses, which is called the inverted plasmonic lens, to accommodate the lithographic fabrication process. In this contribution, we used numerical simulations based on the finite element method in combination with particle swarm optimization to determine ideal parameter ranges and tolerances for the design of inverted plasmonic lenses for different wavelengths in the visible and near-infrared domain and focal lengths between 5 m and 1 mm.",
keywords = "ellipsometry, metrology, numerical simulations, plasmonic lenses",
author = "T. Kaseberg and T. Siefke and S. Kroker and B. Bodermann",
note = "Publisher Copyright: {\textcopyright} 2020 The Author(s). Published by IOP Publishing Ltd.",
year = "2020",
month = jul,
doi = "10.1088/1361-6501/ab7e6b",
language = "English",
volume = "31",
journal = "Measurement science and technology",
issn = "0957-0233",
publisher = "IOP Publishing Ltd.",
number = "7",
}