Defect formation in oxide thin films

verfasst von: Lars O. Jensen, Frank Wagner, Mathias Mende, Céline Gouldieff, Holger Blaschke, Jean Yves Natoli, Detlev Ristau
Abstract: In nanosecond laser damage investigations, the specific defect density in the optical component or thin film plays the key role in triggering optical breakdown. UV irradiation can induce additional defects in optical materials before the damaging event takes place. This increased defect density can even be the main cause for UV laser damage as shown before in fused silica. Moving on to oxide thin films, this contribution will present studies on SiO ₂, Al ₂O ₃, and HfO ₂ ion beam sputtered coatings. Pure material single layers as well as composite material single layers comprised of two oxides have been investigated concerning their tendency to generate additional defects resulting from UV laser irradiation. Within this work, tests at 355 nm and 266 nm have been performed and are compared.
Externe Organisation(en): Laser Zentrum Hannover e.V. (LZH)
Ecole Centrale Marseille
JENOPTIK Optical Systems GmbH
Typ: Aufsatz in Konferenzband
Publikationsdatum: 22.11.2011
Publikationsstatus: Veröffentlicht
Peer-reviewed: Ja
ASJC Scopus Sachgebiete: Elektronische, optische und magnetische Materialien, Physik der kondensierten Materie, Angewandte Informatik, Angewandte Mathematik, Elektrotechnik und Elektronik
Elektronische Version(en): https://doi.org/10.1117/12.899113 (Zugang: Unbekannt)

BibTeX

@inproceedings{705dbfe76dda4465b0a10110dcfa8c2d,
title = "Defect formation in oxide thin films",
abstract = "In nanosecond laser damage investigations, the specific defect density in the optical component or thin film plays the key role in triggering optical breakdown. UV irradiation can induce additional defects in optical materials before the damaging event takes place. This increased defect density can even be the main cause for UV laser damage as shown before in fused silica. Moving on to oxide thin films, this contribution will present studies on SiO 2, Al 2O 3, and HfO 2 ion beam sputtered coatings. Pure material single layers as well as composite material single layers comprised of two oxides have been investigated concerning their tendency to generate additional defects resulting from UV laser irradiation. Within this work, tests at 355 nm and 266 nm have been performed and are compared.",
keywords = "co-deposition, defect density, ion beam sputtering, irradiation induced defects, laser-induced damage",
author = "Jensen, {Lars O.} and Frank Wagner and Mathias Mende and C{\'e}line Gouldieff and Holger Blaschke and Natoli, {Jean Yves} and Detlev Ristau",
year = "2011",
month = nov,
day = "22",
doi = "10.1117/12.899113",
language = "English",
isbn = "9780819488237",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "43rd Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials",
note = "43rd Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2011 ; Conference date: 18-09-2010 Through 21-09-2010",
}