Ion Assisted Deposition Processes

Industrial Network IntIon

verfasst von: Henrik Ehlers, Rudolf Beckmann, Nils Beermann, Ulf Brauneck, Peter Fuhrberg, Dieter Gäbler, Stefan Jakobs, Norbert Kaiser, Michael Kennedy, Friedrich König, Sven Laux, Jürgen Christian Müller, Bernd Rau, Werner Riggers, Detlev Ristau, Dieter Schäfer, Olaf Stenzel, Karl-Josef Becker
Abstract: The presented work is embedded in the research network "Integrative Ion Processes for Modern Optics", called IntIon, consisting of 12 partners from the German optics industry and two research institutes. The main target of the IntIon network is the development of new process concepts on the basis of ion assisted deposition (IAD) for the industrial production of optical thin film components. Besides an improvement in efficiency, a major aim is concentrated on the optical characteristics for selected application fields with high economical potential. In this network, different ion and plasma sources are compared with regard to their qualification for ion assisted deposition processes. This work includes the characterization of the ion energy and ion current using Faraday-cup measurements. The selection of investigated coating materials includes a broad variety of standard and non-standard oxides. First results of the network will be presented for adapted deposition materials and different operation characteristics of ion sources.
Externe Organisation(en): Laser Zentrum Hannover e.V. (LZH)
Leybold Optics GmbH
LISA Laser Products OHG
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF
Mso Jena Mikroschichtoptik GmbH
Linos Photonics GmbH and Co. KG
Merz Pharma GmbH & Co. KGaA
Dr. J. Ch. Muller Vakuum/D.-T.
Roth and Rau AG
Laseroptik GmbH
Quarterwave GmbH
Rupp und Hubrach Optik GmbH
JENOPTIK Optical Systems GmbH
JENOPTIK Laser GmbH
Schott AG
Typ: Aufsatz in Konferenzband
Seiten: 646-655
Anzahl der Seiten: 10
Publikationsdatum: 25.02.2004
Publikationsstatus: Veröffentlicht
Peer-reviewed: Ja
ASJC Scopus Sachgebiete: Elektronische, optische und magnetische Materialien, Physik der kondensierten Materie, Angewandte Informatik, Angewandte Mathematik, Elektrotechnik und Elektronik
Elektronische Version(en): https://doi.org/10.1117/12.514817 (Zugang: Geschlossen)

BibTeX

@inproceedings{8bf730b07b6f488784a203b3b1c3f5da,
title = "Ion Assisted Deposition Processes: Industrial Network IntIon",
abstract = "The presented work is embedded in the research network {"}Integrative Ion Processes for Modern Optics{"}, called IntIon, consisting of 12 partners from the German optics industry and two research institutes. The main target of the IntIon network is the development of new process concepts on the basis of ion assisted deposition (IAD) for the industrial production of optical thin film components. Besides an improvement in efficiency, a major aim is concentrated on the optical characteristics for selected application fields with high economical potential. In this network, different ion and plasma sources are compared with regard to their qualification for ion assisted deposition processes. This work includes the characterization of the ion energy and ion current using Faraday-cup measurements. The selection of investigated coating materials includes a broad variety of standard and non-standard oxides. First results of the network will be presented for adapted deposition materials and different operation characteristics of ion sources.",
keywords = "Ion assisted deposition, Ion sources, NbO, Optical coatings",
author = "Henrik Ehlers and Rudolf Beckmann and Nils Beermann and Ulf Brauneck and Peter Fuhrberg and Dieter G{\"a}bler and Stefan Jakobs and Norbert Kaiser and Michael Kennedy and Friedrich K{\"o}nig and Sven Laux and M{\"u}ller, {J{\"u}rgen Christian} and Bernd Rau and Werner Riggers and Detlev Ristau and Dieter Sch{\"a}fer and Olaf Stenzel and Karl-Josef Becker",
year = "2004",
month = feb,
day = "25",
doi = "10.1117/12.514817",
language = "English",
isbn = "0-8194-5134-7",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
pages = "646--655",
booktitle = "Advances in Optical Thin Films",
address = "United States",
note = "Advances in Optical Thin Films ; Conference date: 30-09-2003 Through 03-10-2003",
}